IC designers are a lucky bunch. Through many years of semiconductor process evolution, the impact of manufacturing limitations and variations on layout could be encapsulated in relatively simple ...
BENGALURU, India — With design rule checking becoming hugely complex in the deep sub-micron regime, there is a large run time for physical verification tools, for the number of design rules that must ...
WILSONVILLE, Ore.--(BUSINESS WIRE)--Mentor Graphics Corporation (NASDAQ:MENT) today announced the release of a major new product in the HyperLynx® suite, the market-leading, high-speed analysis ...
Advances in design checking capability, including foundry-compatible design-rule checking (DRC) and background DRC, are among the features of HiPer Verify, the first tool in a line of IC layout and ...
Between the complexity of advanced node design verification and the competition to be first to the market, system-on-chip (SoC) designers no longer have the luxury of waiting until each sub-block of a ...
Early-stage layout vs. schematic (LVS) and circuit verification typically return large numbers of connectivity errors, which can be a critical bottleneck for both LVS and physical verification flows ...
Siemens has announced an extension of its long‑running collaboration with Taiwan Semiconductor Manufacturing Company (TSMC), ...
SUNNYVALE, Calif.--(BUSINESS WIRE)-- Advanced Semiconductor Engineering, Inc. (ASE), a member of ASE Technology Holding Co., Ltd. (NYSE: ASX, TAIEX: 3711), today announced the launch of its Integrated ...
The semiconductor industry, constrained by the protracted delay in the introduction of next-generation lithography, has had to extend optical lithography below the 100-nanometer node by adopting ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results